rf sputtering meaning in Chinese
射频溅射
Examples
- Meanwhile , there are some changes in the experimental process compared with rf sputtering without magnetic field
与此同时，沉积薄膜的过程中发生了明显变化。 - The study on ce02 - ti02 films can supply a theory and experiment guidance for making ce02 - ti02 coating on glasses by rf sputtering
本论文的研究为磁控溅射法制备ceo _ 2 - tio _ 2薄膜提供了一定的理论和实践依据。 - The influence of thickness , kinds of rf sputtering gas , flux of gas , and gas pressure to the produced licoo _ 2 film was studied , which affected the preferable orientation of the crystal
研究了厚度、溅射气氛、气体流量、气压值等对制备licoo _ 2薄膜中晶体生长择优取向的影响。 - 2 for the first time , rf sputtering method and vapor doping method have been combined to prepare n type bn films . bn films doped with s are n type conductivity
掺s后的氮化硼薄膜表现出n型导电，未掺杂的氮化硼薄膜的电阻率1 . 8 1011 cm ，掺杂后的氮化硼薄膜的电阻率为7 . 3 107 cm 。 - In this article , by rf sputtering the licoo _ 2 film was produced . by hot pressing and cold pressing ( and sintering ) , the licoo _ 2 targets used in the rf sputtering were produced differently . both technics of the preparation of the licoo _ 2 film and the licoo _ 2 target were studied
本文使用热压烧结方法和冷压后烧结方法制备了磁控溅射用的licoo _ 2靶材,并使用磁控溅射方法制备了licoo _ 2薄膜,对两者的制备工艺进行了研究。